Edge Roughness Differences Among EUV Resists

Edge Roughness Differences Among EUV Resists
by Fred Chen on 07-23-2025 at 6:00 am

Edge Roughness Differences Among EUV Resists

EUV resists are a key component in the implementation and optimization of EUV lithography. By converting a limited number of absorbed EUV photons into a variable number of released migrating electrons, the resist becomes the final determinant of resolution. There are two kinds of resist which are seriously considered: chemically… Read More