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Not as much new – No breakthrough announcements, 300 watts is better than 250 watts – Pellicle Problems, TSMC is EUV king – Third times a charm? We attended this years SPIE Lithography convention in San Jose as we have for many years. Although the show was quite enthusiastic and EUV was the central topic, as it has… Read More
Scott Jones and I had the opportunity to talk again with Gary Patton, GlobalFoundries CTO and SVP of R&D for a quick update on 7nm and EUV. Gary has been at GF for two years now with more than 500 other technologists from the IBM semiconductor acquisition. 7nm is the first IBM based process from GF (14nm was licensed from Samsung),… Read More
