High-NA Hard Sell: EUV Multi-patterning Practices Revealed, Depth of Focus Not Mentioned

High-NA Hard Sell: EUV Multi-patterning Practices Revealed, Depth of Focus Not Mentioned
by Fred Chen on 06-04-2025 at 10:00 am

HNA EUV Fred Chen

In High-NA EUV lithography systems, the numerical aperture (NA) is expanded from 0.33 to 0.55. This change has been marketed as allowing multi-patterning on the 0.33 NA EUV systems to be avoided. Only very recently have specific examples of this been provided [1]. In fact, it can be shown that double patterning has been implemented… Read More