Stitched Multi-Patterning for Minimum Pitch Metal in DRAM Periphery

Stitched Multi-Patterning for Minimum Pitch Metal in DRAM Periphery
by Fred Chen on 04-08-2025 at 6:00 am

Figure 1. Splitting a metal layout for stitched double patterning for better pitch uniformity.

In a DRAM chip, the memory array contains features which are the most densely packed, but at least they are regularly arranged. Outside the array, the regularity is lost, but in the most difficult cases, the pitches can still be comparable with those within the array, though generally larger. Such features include the lowest metal… Read More