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I’ve been quite impressed that modern ICs use a lithography process with 193nm light sources to resolve final feature sizes at 20nm and smaller dimensions. We’ve been blogging about Double Patterning Technology (DPT) some 45 times in the past few years that enable 20nm fabrication, so one big question for me is, “How… Read More
David Abercrombie from Mentor Graphics met with me on Tuesday at DAC to provide an update on DPT – Double Patterning Technology, something new required for several layers starting at the 20nm node in order to get any IC yield. DPT is also part of Multiple-Patterning.… Read More
