Webinar: Enabling Next Generation Lithography Through Computational Mask and Wafer Metrology
Time: 9:00AM Central Europe | 4:00PM China | 5:00PM Japan/Korea
Featured Speakers:
- Jirka Schatz, Applications Engineer, Synopsys
- Wolfgang Demmerle, Product Manager, Synopsys
Metrology data is the foundation for lithography models which play an essential role in process development and photomask creation.
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