– SPIE Photomask -all about High NA and bigger masks
– High NA will ramp very fast & is ramping fast – two already at Intel
– Doubling size of photomask will offset High NA exposure size problem
– Assembling litho tools at customer saves time/money- “Scanner Kits”
SPIE Monterey- ASML, INTC – High NA Readiness- Bigger Masks/Smaller Features
