The AVS 26th International Conference on Atomic Layer Deposition (ALD 2026) featuring the 13th International Atomic Layer Etching Workshop (ALE 2026) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching. Since 2001, the
With half-pitch approaching 10 nm, EUV patterning is heavily impacted by stochastic effects, which are aggravated from reduced image contrast from electron blur [1]. A two-mask (“LELE”: Litho-Etch-Litho-Etch) approach was proposed to pattern core features for self-aligned double patterning (SADP)… Read More
Atomic layer deposition (ALD) is a thin-film deposition method that continues to enable continuous advances in semiconductor device fabrication. Essentially, it involves exposing substrates sequentially to at least two different vapor phase atmospheres in which self-limiting reactions take place on the surface: the first… Read More
I had a follow-on discussion with Alex Yoon from our podcast last year. He is as a Head of Strategic and Emerging Technologies and partnerships at Intermolecular, part of EMD electronics.
Prior to joining EMD electronics, he was Senior Technical Director at Lam Research, led activities in emerging memory and novel materials … Read More
