Full-Chip Electromigration Analysis

Full-Chip Electromigration Analysis
by Daniel Payne on 10-10-2014 at 7:00 am

I’ll never forget debugging my first DRAM chip at Intel, peering into a microscope and watching the aluminum interconnect actually bubble and dissolve as the voltage was increased, revealing the destructive effects of Electromigration (EM) failure. That was back in 1980 using 6 um, single level metal technology, so imagine… Read More