Graphical DRC vs Text-based DRC

Graphical DRC vs Text-based DRC
by Daniel Payne on 05-01-2011 at 11:42 am

Introduction
IC designs go through a layout process and then a verification of that layout to determine if the layout layer width and spacing rules conform to a set of manufacturing design rules. Adhering to the layout rules will ensure that your chip has acceptable yields.

At the 28nm node a typical DRC (Design Rule Check) deck will… Read More


ARM vs Intel…Performance? Power? OS support? Or ubiquity?

ARM vs Intel…Performance? Power? OS support? Or ubiquity?
by Eric Esteve on 03-22-2011 at 2:18 pm

This blog was posted 10 months ago, and the comments have made it much more interesting! Don’t miss the various comments at the back. Also feel free to let us know if you think the status, in this ARM vs Intel “war” has changed a lot since March 2011. Do you really think Intel has catch up with ARM in the mobile industry?Read More


Getting Real Time Calibre DRC Results

Getting Real Time Calibre DRC Results
by Daniel Payne on 03-10-2011 at 10:00 am

Last week I met with Joseph Davis, Ph.D. at Mentor Graphics in Wilsonville, Oregon to learn about a new product designed for full-custom IC layout designers to improve productivity.

The traditional flow for full-custom IC layout designers has been nearly unchanged for decades:

  • Read a schematic or use Schematic Driven Layout
Read More

TSMC Versus The FabClub!

TSMC Versus The FabClub!
by Daniel Nenni on 01-23-2011 at 11:00 pm


The Common Platform Technology Forum last week was not well attended, less than half than the GlobalFoundries Conference. It was deja vu of previous CP forums but there were a couple of surprises to go with the disappointment. The lunch line was long, but fortunately I was escorted to the press lunch featuring VIP’s from Samsung,… Read More


Getting to the 32nm/28nm Common Platform node with Mentor IC Tools

Getting to the 32nm/28nm Common Platform node with Mentor IC Tools
by Daniel Payne on 01-17-2011 at 6:04 pm

Last week I talked with two experts at Mentor about the challenges of getting IC designs into the 32nm/28nm node on the Common Platform (IBM, GLOBALFOUNDRIES and Samsung). Global Foundries issued a press release talking about how the four major EDA companies have worked together to qualify EDA tools for this node.

Sudhakar Jilla,… Read More