Mask Optical Simulation Research and Development Engineer

1. Clear understanding of imaging theories (Abbe, Hopkins)
2. Experience in RET/OPC and rigorous simulation
3. Knowledge in EUV lithography and challenges
4. Chemical amplified resist, Negative tone development and resist processing
5. Knowledge in optimization methods
6. Familiar with lithography scanner system and the key imaging modules is a plus
7. Knowledge of data analytics and machine learning
8. Research, evaluate, and present statistical or machine learning methods to provide actionable insights.

1. Master’s degree or above, PhD is preferred. Major in EE, Physics or Optics
2. Experience in lithography or related fields
3. Solid understanding of imaging theories (Abbe, Hopkins)
4. Direct or indirect experience in OPC (Optical Proximity Correction), including rigorous lithography simulation (Hyperlith, Prolith), RET, and advanced mask technology
5. Intermediate to advanced software programming skills is a plus