user_2013101
Banned
The misinformation is not limited to Intel’s questionable claims of density superiority that I had written about. (Links at end)
[h=3]Immersion lithography[/h]
It is the most critical step in IC production. According to Wikipedia:
"Immersion lithography is a photolithography resolution enhancement technique for manufacturing integrated circuits (ICs) that replaces the usual air gap between the final lens and the wafer surface with a liquid medium"
The benefit:
"The resolution enhancement from immersion lithography is about 30-40%"
"The successful emergence of immersion lithography comes not just from its ability to extend resolution and depth of focus, but also from its timely introduction to the industry between 65 nm and 45 nm nodes.
The status
"Intel's 32 nm process uses second-generation high-k, metal gate technology, but this will be the first time Intel has deployed immersion lithography."
"On March 23, 2012, with the release of the Ivy Bridge chip, Intel's Senior Fellow Mark Bohr stated that the company will be able to extend its current immersion process to the 14-nm and even 10-nm chips before EUV would be necessary."
Immersion lithography - Wikipedia, the free encyclopedia
Most people will develop an impression, from the Wikipedia, that Intel is the pioneer and leader of this key technology.
[h=3]The misinformation[/h]
The data itself is basically true. But, the impression is false.
If the data is correct, then, where is the misinformation?
The misinformation is in the deliberate omission of the crucial point: immersion lithography was invented in 2002 by Dr. Burn Jeng Lin, VP of R&D at TSMC. TSMC is the pioneer; Intel, a follower. But, nowhere in the Wikipedia mentions Lin or TSMC. This is another example of the disingenuous pro-Intel misinformation.
In 2013, IEEE honors Dr. Lin with an award for this invention.
27th June 2013
IEEE honours inventor of immersion lithography
The inventor of immersion lithography – Dr. Burn J. Lin - has been recognised by the IEEE with the award of the IEEE’s 2013 Jun-ichi Nishizawa Medal.
...
“His perseverance in convincing the industry to make the change to immersion lithography has extended Moore’s law from 40nm to potentially as low as 10nm. That at least 82% of all transistors currently in the world have been made with immersion lithography is a testament to Lin’s impact,” IEEE said in its citation.
IEEE honours inventor of immersion lithography | Electronics Weekly
[h=3]More backgrounds[/h]
Dr. Lin invented the lithography itself in the early 1970’s at IBM Thomas J. Watson Research Center, Yorktown Heights, New York. The following is a paper by Dr. Lin published in 1975.
Deep uv lithography
He is also a member of the US National Academy of Engineering, an IEEE fellow and SPIE fellow.
In 2009, Lin received IEEE CLEDO BRUNETTI AWARD. IEEE wrote: "Dr. Lin has continued the cause for immersion lithography with groundbreaking papers that have mapped out scaling laws for super-high numerical aperture immersion optics, and he has led the development of defect-reduction methods to address concerns regarding the technology."
In Taiwan, Dr. Lin is considered "the father of lithography." In the US, Intel invented everything in chip-making.
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[h=3]Immersion lithography[/h]
It is the most critical step in IC production. According to Wikipedia:
"Immersion lithography is a photolithography resolution enhancement technique for manufacturing integrated circuits (ICs) that replaces the usual air gap between the final lens and the wafer surface with a liquid medium"
The benefit:
"The resolution enhancement from immersion lithography is about 30-40%"
"The successful emergence of immersion lithography comes not just from its ability to extend resolution and depth of focus, but also from its timely introduction to the industry between 65 nm and 45 nm nodes.
The status
"Intel's 32 nm process uses second-generation high-k, metal gate technology, but this will be the first time Intel has deployed immersion lithography."
"On March 23, 2012, with the release of the Ivy Bridge chip, Intel's Senior Fellow Mark Bohr stated that the company will be able to extend its current immersion process to the 14-nm and even 10-nm chips before EUV would be necessary."
Immersion lithography - Wikipedia, the free encyclopedia
Most people will develop an impression, from the Wikipedia, that Intel is the pioneer and leader of this key technology.
[h=3]The misinformation[/h]
The data itself is basically true. But, the impression is false.
If the data is correct, then, where is the misinformation?
The misinformation is in the deliberate omission of the crucial point: immersion lithography was invented in 2002 by Dr. Burn Jeng Lin, VP of R&D at TSMC. TSMC is the pioneer; Intel, a follower. But, nowhere in the Wikipedia mentions Lin or TSMC. This is another example of the disingenuous pro-Intel misinformation.
In 2013, IEEE honors Dr. Lin with an award for this invention.
27th June 2013
IEEE honours inventor of immersion lithography
The inventor of immersion lithography – Dr. Burn J. Lin - has been recognised by the IEEE with the award of the IEEE’s 2013 Jun-ichi Nishizawa Medal.
...
“His perseverance in convincing the industry to make the change to immersion lithography has extended Moore’s law from 40nm to potentially as low as 10nm. That at least 82% of all transistors currently in the world have been made with immersion lithography is a testament to Lin’s impact,” IEEE said in its citation.
IEEE honours inventor of immersion lithography | Electronics Weekly
[h=3]More backgrounds[/h]
Dr. Lin invented the lithography itself in the early 1970’s at IBM Thomas J. Watson Research Center, Yorktown Heights, New York. The following is a paper by Dr. Lin published in 1975.
Deep uv lithography
He is also a member of the US National Academy of Engineering, an IEEE fellow and SPIE fellow.
In 2009, Lin received IEEE CLEDO BRUNETTI AWARD. IEEE wrote: "Dr. Lin has continued the cause for immersion lithography with groundbreaking papers that have mapped out scaling laws for super-high numerical aperture immersion optics, and he has led the development of defect-reduction methods to address concerns regarding the technology."
In Taiwan, Dr. Lin is considered "the father of lithography." In the US, Intel invented everything in chip-making.
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