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Marc Evans, Director of Business Development & Marketing, Andes Technology USA
I work at a RISC-V IP company, and I genuinely root for Arm — probably more than most people in my position would admit. Not because I’m confused about who competes with whom, but because Arm’s best move for their shareholders is also… Read More
We all know the semiconductor industry is seeing a new era of data intensity. The industry’s response includes advanced semiconductor design strategies, the adoption of chiplets, and the integration of optical I/O and photonics to enable higher performance, faster AI computation, and increased modularity. Co-packaged photonics… Read More
The embedded world Exhibition & Conference recently concluded. The event is held annually in Nuremberg, Germany and has become one of the most influential gatherings for the global embedded systems community. Since its inception in 2003, the event has grown from a modest technical meeting into a large-scale international… Read More
This informative webinar discusses a significant issue that is cropping up for sub-5nm designs. As the graphic above shows, modeling uncertainty at advanced nodes results in excessive guard banding. These guard bands result in reduced performance and profit. A loss of 25 – 35% in PPA is discussed, along with the lost profit associated… Read More
In forty plus years as a semiconductor professional I have never seen a semiconductor design ecosystem build as fast and as strong as RISC-V. As a result, RISC-V Now! has emerged as a pivotal gathering, a conference with a clear and ambitious mission: To transform the open, modular, and flexible RISC-V ISA from an exciting specification… Read More
The Sensors Converge Conference is one of the premier technical gatherings dedicated to the design, integration, and deployment of sensing technologies across industries. The event brings together engineers, system architects, researchers, and product developers to explore advancements in sensor hardware, edge computing,… Read More
In the pursuit of advanced extreme ultraviolet (EUV) lithography for high-NA patterning, metal oxide resists (MORs) offer significant promise but face challenges like critical dimension (CD) variation due to atmospheric interactions. Presented at SPIE Advanced Lithography + Patterning 2025 by Kevin M. Dorney and colleagues… Read More
At the recent Chiplet Summit, presentations, discussions and general participation could be broken down into a few broad categories. There were presentations of actual chiplet designs, either as building blocks or end products. There were presentations regarding design tools and methodologies to support and accelerate … Read More
At 3nm and below, clock networks have quietly become the dominant limiter of SoC power, performance, and yield. Yet most advanced-node designs still rely on abstraction-based signoff methodologies developed when voltage headroom was generous and interconnect effects were secondary.
That assumption no longer holds
As supply… Read More
The recent Chiplet Summit in Santa Clara was buzzing with new designs and new design methods. It felt like the industry had turned a corner at this year’s event with lots of new technology and design success on display. Siemens EDA had a large presence at the show and took home the Best in Show Award for Packaging Design. There were a … Read More
Musk’s Orbital Compute Vision: TERAFAB and the End of the Terrestrial Data Center