You are currently viewing SemiWiki as a guest which gives you limited access to the site. To view blog comments and experience other SemiWiki features you must be a registered member. Registration is fast, simple, and absolutely free so please,
join our community today!
Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques. Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More
As design complexity and size is increasing, SoC verification has become one of the most difficult and time consuming tasks in the design closure.UVM (Universal Verification Methodology, an accellera initiative) is one of the best verification methodologies that support common language, coherent strategy, clarity and transparency… Read More
