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Cutting the Key to 14nm Lithographyby Beth Martin on 04-08-2013 at 2:30 pmCategories: EDA, Siemens EDA
It appears that immersion lithography is now the plan of record for manufacturing ICs at 14nm. How is it possible to use 193nm wavelength light at 14nm? How can we provide the process window to pattern the such tight pitches? The secret lies in computational lithography. For 20nm, the two key innovations in computational lithography… Read More