The Future of Lithography Process Models

The Future of Lithography Process Models
by Beth Martin on 01-30-2012 at 4:02 pm

Always in motion is the future. ~Yoda

For nearly ten years now, full-chip simulation engines have successfully used process models to perform OPC in production. New full-chip models were regularly introduced as patterning processes evolved to span immersion exposure, bilayer resists, phase shift masking, pixelated illumination… Read More