CD-Pitch Combinations Disfavored by EUV Stochastics

CD-Pitch Combinations Disfavored by EUV Stochastics
by Fred Chen on 11-29-2020 at 6:00 am

CD Pitch Combinations Disfavored by EUV Stochastics

Ongoing investigations of EUV stochastics [1-3] have allowed us to map combinations of critical dimension (CD) and pitch which are expected to pose a severe risk of stochastic defects impacting the use of EUV lithography. Figure 1 shows a typical set of contours of fixed PNOK (i.e., the probability of a feature being Not OK due… Read More