Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques. Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More
Ansys 2023 R2: Ansys Charge Plus What’s New
Ansys Charge Plus (formerly EMA3D Charge) has received some important updates in the 2023 R2 release, including integration of its PIC and CFD solvers with Ansys Chemkin-Pro, improvements to plasma and gas flow modeling, and updates to the mesh engine.
TIME:
SEPTEMBER 21, 2023
11 AM EDT / 4 PM GMT / 8:30 PM IST
Venue:
Virtual