Not as much new – No breakthrough announcements, 300 watts is better than 250 watts – Pellicle Problems, TSMC is EUV king – Third times a charm? We attended this years SPIE Lithography convention in San Jose as we have for many years. Although the show was quite enthusiastic and EUV was the central topic, as it has… Read More
At the imec technology forum held at SEMICON West, Martin Van Den Brink, President and CTO of ASML presented on the latest developments on EUV. I also had an opportunity to sit down with Mike Lercel, ASML Director of Strategic Marketing for an interview.… Read More
Shakespeare reckoned that a man went through seven stages in his life.All the world’s a stage, And all the men and women merely players. They have their exits and their entrances, And one man in his time plays many parts, His acts being seven ages.
Well, an EUV mask seems to only go through three main stages:
Round #1 was here.
In the EUV corner were Stefan Wurm of Sematech (working on mask issues mostly) and Skip Miller of ASML who are the only company making EUV steppers (and light sources, they acquired Cymer).
You may know that the biggest issue in EUV is getting the source brightness to have high enough energy that an EUV stepper has … Read More
I was at the Common Platform Technology Forum this week. One of the most interesting sessions is IBM’s Gary Patton giving an overview of the state of semiconductor fabrication. Then, at lunchtime, he is one of the people that the press can question. In this post, I’m going to focus on Extreme Ultra-Violet (EUV) lithography.… Read More