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20nm SoC Designby Paul McLellan on 08-25-2011 at 12:48 amCategories: Uncategorized
There are a large number of challenges at 20nm that didn’t exist at 45nm or even 32nm.
The biggest issues are in the lithography area. Until now it has been possible to make a reticle using advanced reticle enhacement technology (RET) decoration and have it print. Amazing when you think that at 45nm we are making 45nm features… Read More
