Seminar on IC Yield Optimization at DATE on March 14th

Seminar on IC Yield Optimization at DATE on March 14th
by Daniel Payne on 02-22-2012 at 3:59 pm

My first chip design at Intel was a DRAM and we had a 5% yield problem caused by electromigration issues, yes, you can have EM issues even with 6um NMOS technology. We had lots of questions but precious few answers on how to pinpoint and eliminate the source of yield loss. Fortunately, with the next generation of DRAM quickly introduced… Read More