Mentor Extends AI Footprint

Mentor Extends AI Footprint
by Bernard Murphy on 05-23-2019 at 8:00 am

Mentor are stepping up their game in AI/ML. They already had a well-established start through the Solido acquisition in Variation Designer and the ML Characterization Suite, and through Tessent Yield Insight. They have also made progress in prior releases towards supporting design for ML accelerators using Catapult HLS. Now… Read More


OPC Model Accuracy and Predictability – Evolution of Lithography Process Models, Part III

OPC Model Accuracy and Predictability – Evolution of Lithography Process Models, Part III
by Beth Martin on 08-15-2011 at 7:00 am

Wyatt Earp probably wasn’t thinking of OPC when he said, “Fast is fine, but accuracy is everything,” but I’ll adopt that motto for this discussion of full-chip OPC and post-OPC verification models.

Accuracy
is the difference between the calibrated model prediction and the calibration wafer result. Accuracy depends on several… Read More