Dosing for EUV lithography walks a fine line between productivity and defectivity. Fabs can choose higher-dose exposures to suppress photon shot noise [1]. However, higher doses require EUV machines to scan the wafer at slower speeds, degrading throughput [2].
On the other hand, there is the threat of resist thickness loss that… Read More







Intel 18A vs Intel 18A-P: What Is the Difference and Why Does It Matter?