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Stochastics: Yield-Killing Gap No One Wants to Talk About

So, will it be used for increasing the throughput at same dose, or increasing the dose at same throughput? Again, the net benefit of increasing the dose depends on the resist.
Yes I think effectively at each new node they increase the dose at the same throughput to hit their dimension targets (since as you know the stochastic issues get more difficult the smaller the feature size).
 
The dose increase required to get the photon shot noise to pre-EUV levels will be exorbitant: https://semiwiki.com/lithography/357643-facing-the-quantum-nature-of-euv-lithography/

DUV vs EUV dose fluctuation table.png
 
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