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High-NA adds 3 new problems Low-NA doesn't have: (1) reduced depth of focus (so need much thinner resist films); (2) the 104 mm x 132 mm mask area maps to a 26 mm x 16.5 mm wafer exposure field instead of the conventional 26 mm x 33 mm; (3) central obscuration will limit some combinations of...
As 3nm GAA yields stabilize, Samsung Electronics fcuses on 2nm process to narrow TSMC's lead
By Chun Byung-soo, Kim Seo-young
Published 2025.05.13. 16:09
Samsung Electronics’ foundry division is reportedly nearing the final stage of evaluating its 2-nanometer (nm) process with Nvidia and...
Actually the proposed 18A use was reported a while back in Feb (https://www.reuters.com/technology/intel-says-first-two-new-asml-machines-are-production-with-positive-results-2025-02-24/), but it seems now the update is they would only consider it for a few layers of 14A. Maybe they don't have...
FWIW, NA is not figuring into EUV practical resolution. It's resist-limited at this point. https://www.spiedigitallibrary.org/conference-proceedings-of-spie/13424/1342403/NA033-EUV-extension-for-HVM-testing-single-patterning-limits/10.1117/12.3052244.full
Not all EUV machines in use are equally productive. Old/new mix.
Abstract
ASML has been making steady advances in Extreme Ultraviolet (EUV) light source capability for more than 15 years. Since introduction of the 250W EUV light source in 2018, which ushered in the era of EUV High Volume...
I thought they presented SALELE with one block mask. Actually, it is usually presented with two block masks, one for each of the two metal line sub-patterns.
I suppose it depends what they count as a "step".
24-32 nm pitch on 0.33 NA is just like 24-30 nm pitch on 0.55 NA. I don't know if the...
6-track cell height scaling trend shows an interesting comparison between TSMC and Intel. PowerVia gave opportunity to relax the track pitch at Intel 18A. In the meantime, the track pitch scaling slowed down dramatically for TSMC. Perhaps it's coincidental with nanosheet introduction?
In my recollection, it was merely from the drawing of the HD and HP cells, both appeared to be 5 tracks, and the cell heights are 160 and 180 respectively.
Both size and spacing matter for the pitch dependent best focus.
