T17.3 | A Three Dimensional DRAM (3D DRAM) Technology for the Next Decades (Late News) - 2024 VLSI Symposium
Authors: Joodong Park1, kangsik Choi1, Seunghwan Kim1, Jungwon Seo1, Hongseong Kang1, Seungwan Chu1, Seokwon Bae1, Jeonghoon Kwon1, Gilseop Kim1, Yongtaek Park1, Junha Kwak1, Dongil Song1, Sungmean Park1, Yongtaik Kim1, Kyoungchul Jang1, Jinsun Cho1, Heesun Lee1, Byungho Lee1, Jinwon Park1...
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Joodong Park1, kangsik Choi1, Seunghwan Kim1, Jungwon Seo1, Hongseong Kang1, Seungwan Chu1, Seokwon Bae1, Jeonghoon Kwon1, Gilseop Kim1, Yongtaek Park1, Junha Kwak1, Dongil Song1, Sungmean Park1, Yongtaik Kim1, Kyoungchul Jang1, Jinsun Cho1, Heesun Lee1, Byungho Lee1, Jinwon Park1, Jihye Lee1, Hyuk Kwon1, Dosun You1, Chansun Hyun1, Jaejung Lee1, Seungcheol Lee1, Ildo Kim1, Juhyun Myung1, Hyungsik Won1, Junho Cheon1, Kyunghoon Kim1, Jiho Kang1, Seungbum Kim1, Kihong Lee1, Suock Chung1, Seonsoon Kim1, Byoungki Lee1, Choonhwan Kim1, Seonyong Cha1 1SKhynix
Three dimensional structured DRAM technology has drawn huge attention recently for its potential to fulfill high speed operation and low power consumption. In this paper, 3D DRAM with vertical bit line (BL) architecture is introduced as a promising solution to overcome scaling limitation for future DRAM technology. Full chip integration with 5-layered cell stacked on peri-core wafer is successfully demonstrated for the first time, offering superior on-current performance and gate controllability. A novel process integration scheme using Si/SiGe sacrificial multilayers and hybrid wafer bonding technique is presented with excellent full chip operation of 3D DRAM.