Plasma Etching, ALE, and RIE (SEMI University)

Online

This course discusses the fundamentals of plasma assisted phenomena and reactive ion etching (RIE) processes. The emphasis is on the physical and chemical processes that determine the consequences of a reactive gas plasma/surface interaction. The role of energetic ions as encountered in RIE systems is discussed in detail and the factors which influence anisotropy of …

HLS Hackathon 2025

Online

Wednesday, July 2, 2025 - Friday, October 31, 2025 Accelerating Inferencing Using HLS Hackathon Energy efficiency is essential for edge devices, especially those powered by batteries or harvested energy, making …