Wiki Tag: Samsung 3nm
Samsung 3nm Process Technology Wiki
Official Names:
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Samsung 3GAE (3nm Gate-All-Around Early)
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Samsung 3GAP (3nm Gate-All-Around Plus)
Technology Type: Gate-All-Around (GAA) FET – MBCFET™
Developer: Samsung Electronics (Samsung Foundry)
Announced: 2021 (3GAE), 2022 (3GAP)
Mass Production Start: -
3GAE: June 2022
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3GAP: Expected 2024–2025
Predecessor: 4nm
TSMC N3 Process Technology Wiki
Overview
TSMC N3 is the 3-nanometer FinFET semiconductor manufacturing node developed by Taiwan Semiconductor Manufacturing Company (TSMC). It is a major milestone in TSMC’s process technology roadmap and represents the first step into the 3nm era, succeeding the N5 and N4 nodes.
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