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The SPIE Advanced Lithography + Patterning Symposium recently concluded. This is a popular event where leading researchers gather. Challenges such as optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications are all covered. This… Read More
Back in 2020 I first learned from Synopsys about how they had engineered a better way to do optimize layouts on digital designs by using machine learning techniques, instead of relying upon manual approaches. The product was named DSO.ai, standing for Design Space Optimization, and it produced a more optimal floor-plan in less… Read More
