“Inverse lithography technology (ILT) represents the most significant EDA advance in the last two decades.” Danping Peng from TSMC made that assertion at the recent SPIE Advanced Lithography + Patterning Conference, in his talk entitled: ILT for HVM: History, Present, and Future. This article summarizes the highlights… Read More
Podcast EP364: The Broad Impact of Advanced Mask Solutions, Today and Tomorrow with Dr. Germain Fenger
Daniel is joined by Dr. Germain Fenger, Senior Director of Product Management at Synopsys where he leads advanced mask solutions and computational lithography technologies. With a background spanning semiconductor manufacturing, lithography research, engineering, and product leadership, Germain has held roles at imec,… Read More
