TSMC's EUV Dynamic Power Saving: A Win-Win for Energy Efficiency and Production Capacity
Implementing Fab Automation is Projected to Accumulate 190 Million kWh in Electricity Savings by 2030Enhancing energy efficiency is a cornerstone of TSMC's strategy to achieve net-zero emissions. As advanced semiconductor process technologies evolve, the number of Extreme Ultraviolet (EUV) lithography machines within our fabs continues to grow. To pursue both technology development and environmental sustainability, TSMC has collaborated with its suppliers to launch the "EUV Dynamic Energy Saving Program". Based on a successful pilot run in a fab, annual energy savings from this program are estimated account for 8% of the tool's total yearly energy consumption. Since September 2025, this system has been progressively introduced at Fab 15B, Fab 18A, and Fab 18B. By the end of this year, it will be fully deployed across all TSMC EUV machines globally and adopted as a standard configuration for all new fab specifications. By 2030, this program is projected to deliver cumulative electricity savings of 190 million kWh and reduce carbon emissions by 101 kilotons, achieving both significant energy conservation and sustained production capacity.
Upgrading Fab Automation to Optimize EUV Power Utilization
TSMC is committed to embedding green management practices into its daily operations and endeavors to drive the low-carbon transformation of its entire industry value chain. To further enhance energy utilization efficiency, in 2024, TSMC partnered with equipment suppliers to initiate this energy-saving program and successfully reduced its instantaneous power consumption by 44%. Furthermore, TSMC incorporates relevant control mechanisms in conjunction with the fab automation system, tailored to production demands, effectively reducing energy consumption while upholding stable production capacity, thus embodying eco-responsible and green manufacturing practices.EUV Dynamic Power Saving
In alignment with the United Nations Sustainable Development Goal (SDG) 7 – Affordable and Clean Energy, TSMC continues to expand the scope of its energy-saving initiatives. In addition to dynamic energy-saving measures for EUV lithography equipment, TSMC is actively evaluating the implementation of similar functionalities in Deep Ultraviolet (DUV) lithography equipment and other module equipment beyond lithography applications. These efforts aim to further enhance energy utilization efficiency across the entire production process, demonstrating TSMC's commitment to sustainable development through innovative technological advancements.