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The EUV system would be under several Pa vacuum containing hydrogen, yet in the patent they assume it is air with some hydrogen mixed in ("Because the hydrogen is lighter than air, it rises in a vertical direction relative to the air.") Hydrogen has the least absorption of EUV.
The EUV system would be under several Pa vacuum containing hydrogen, yet in the patent they assume it is air with some hydrogen mixed in ("Because the hydrogen is lighter than air, it rises in a vertical direction relative to the air.") Hydrogen has the least absorption of EUV.
You are correct, when I developed the EUV source collector mirror cooler, the partial vacuum contained hydrogen only.
Due to optical distortion, the cooler could not make contact with the silicon collector mirror, so I used the partial pressure of hydrogen, and gas gap conductance, for the solution.