Recent study of 28 nm pitch single exposure

[Fred Chen]

https://www.researchgate.net/publication/364847576_Investigating_metal_oxide_resists_for_patterning_28-nm_pitch_structures_using_single_exposure_extreme_ultraviolet_defectivity_electrical_test_and_voltage_contrast_study

This interesting study from late 2022 focused on 28 nm pitch structures with EUV single exposure. A key focus was on tip-to-tip space printing. These features are stochastic hotspots, particularly with smaller spaces and shorter staggered trenches (essentially 56 nm pitch).