Array
(
    [content] => 
    [params] => Array
        (
            [0] => /forum/threads/new-four-element-semi-material-a-real-advance.23230/
        )

    [addOns] => Array
        (
            [DL6/MLTP] => 13
            [Hampel/TimeZoneDebug] => 1000070
            [SV/ChangePostDate] => 2010200
            [SemiWiki/Newsletter] => 1000010
            [SemiWiki/WPMenu] => 1000010
            [SemiWiki/XPressExtend] => 1000010
            [ThemeHouse/XLink] => 1000970
            [ThemeHouse/XPress] => 1010570
            [XF] => 2021770
            [XFI] => 1050270
        )

    [wordpress] => /var/www/html
)

New four element semi material, A real advance?

Arthur Hanson

Well-known member
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Researchers at the Jülich Research Center and the Leibniz Institute for Innovative Microelectronics (IHP) have developed a material that has never existed before: a stable alloy of carbon, silicon, germanium, and tin. The new compound, abbreviated as CSiGeSn, opens up exciting possibilities for applications at the interface of electronics, photonics, and quantum technology.

What makes this material special is that all four elements, like silicon, belong to Group IV of the periodic table. This ensures compatibility with the standard manufacturing method used in the chip industry—the CMOS process—a crucial advantage.


Is this a significant advance, any thoughts or comments appreciated
 
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