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Search results

  1. S

    Intel Installs ASML TWINSCAN EXE:5200B High-NA EUV System for 14A Process Node

    Yes, at least 2 EXE:5000 development systems are in Oregon and the EXE:5200 production system is mostly likely there too. The HNA field is half the size of an LNA field, but the throughput for an EXE:5200 is basically the same as the throughput for an NXE:3800B (latest LNA production system) at...
  2. S

    Intel Installs ASML TWINSCAN EXE:5200B High-NA EUV System for 14A Process Node

    Intel got the first EXE:5000, that is a development machine and they received at least one more EXE:5000. Now they are starting to get EXE:5200 production machines, so yes, different machines.
  3. S

    Can Intel recover even part of their past dominance?

    At TechInsights we do detailed floorplan analysis of various chips. A little over a year ago I took 10 leading edge logic chip floorplans done on 7nm and 5nm nodes, Intel and AMD Microprocessors, Apple M and A processors, NVIDIA GPU, Qualcomm, Media Tech, and Broadcom. Logic was ~1/2 of the...
  4. S

    How "fungible" are memory maker fabs for switching between memory types?

    They all use the same fab process although HBM add TSVs - basically do a new design and run it through the fab. There is no downtime unless you consider reticle changes on a scanner downtime. HBM does require 2 to 4x the silicon of LPDDR due to a bigger die and poor stacking yields due to TSVs...
  5. S

    Intel 18A Dimensions Leaked?

    To the best of my knowledge Intel has only disclosed 18A pitches under NDA, I have not seen a public disclosure and I talk to Intel all the time.
  6. S

    Humidity Control Challenges & Best Practices?

    Photolithography is the most critical and is typically controlled to + or - 1%, the rest of the fab is more like + or - 5%. Humidity is monitored and controlled in real time by the facility management system. For large fabs with a centralized control room it would be monitored there. In modern...
  7. S

    Updating our current logic density benchmarking methodologies

    With respect to yield, the defect density is based on electrical test of test chips designed to the pdk, I think the basic idea is the pdk is supposed to define all the design rules you need to meet to yield to the extracted defect density, but they aren't perfect and get updated periodically...
  8. S

    Updating our current logic density benchmarking methodologies

    There are two fundamental problems with characterizing processes using the blocks you outline above. 1) Each block density will depend on the process and the design, not just the process. Two different designs with different design goals done on the same process can have very different...
  9. S

    Updating our current logic density benchmarking methodologies

    You are misunderstanding the methodology, there isn't a "standard number of fins", you have to do the whole analysis for each process/node. First, you have to take into account diffusion break, the 2-input NAND and Scan Flip Flop width depend on diffusion break. Everyone is using the same...
  10. S

    ISSCC N2 and 18A has same SRAM Density.

    I am not a design guy but my guess is the libraries will have to be different.
  11. S

    ISSCC N2 and 18A has same SRAM Density.

    See my post above, BPD is more expensive and the mobile guys don't need it and don't want to pay for it. I am hearing the foundries will have to offer with and without BPD plus different metallization schemes.
  12. S

    ISSCC N2 and 18A has same SRAM Density.

    It can also be dramatically cheaper because you don't need 17+ interconnect layers. I haven't seen any of the big logic companies talking about dedicated SRAM processes, maybe as ChipLets catch on it will generate interest.
  13. S

    ISSCC N2 and 18A has same SRAM Density.

    “TSMC said that 4.2 GHz speed was for the HC array not the HD array.” I looked at the paper specifically to determine whether is was HD or HP/HC. On slide 27 they show the test chip and specifically say it is HD, slide 28 and 29 show Vmin plots and again say HD, slide 30 is the Shmoo plot and...
  14. S

    Building A Chipmaking Fab In The US Costs Twice As Much, Takes Twice As Long As In Taiwan

    The 2x is for the fab construction and doesn't include tools. I didn't think it was that big a difference either and I got a bunch of expert inputs when I wrote my operating cost comparison article a few year ago. I think things may have changed post COVID, I am looking into it.
  15. S

    ISSCC N2 and 18A has same SRAM Density.

    I have a bunch of comments on this thread I am going to roll into one big comment. With respect to the Fmax Shmoo plots, what isn’t obvious until you read the papers is TSMC’s array is HD cells (plus double pumped although I don’t think that matters for clock speed). Intel’s array is HP cells...
  16. S

    Will Niobium Phosphide replace copper in chips?

    Everyone was thinking Ruthenium (Ru) but then they woke up to how expensive it is. My belief is Molybdenum (Mo) for vias first and then critical interconnect over the next several years. Mo is reasonably inexpensive, almost as low resistance at small dimensions as Ru, can be barrierless and can...
  17. S

    TSMC's New N4C

    Does anyone know what “Masking layer reduction as post silicon option” means?
  18. S

    TSMC May Increase Wafer Pricing by 10% in 2025

    TSMC released their 2024-Q2 results today and I went through my proprietary analysis. I see no evidence that 5nm equipment dropped off being depreciated yet.
  19. S

    TSMC May Increase Wafer Pricing by 10% in 2025

    I reached out to sources with direct knowledge of how the start of depreciation is handled at Semiconductor companies, see my post above. Yes "Depreciation of an asset begins when it is available for use" but there is some interpretation that goes into "available for use".
  20. S

    TSMC May Increase Wafer Pricing by 10% in 2025

    I reached out to multiple sources with direct knowledge of when depreciation starts. Yes, the standard is: "Depreciation of an asset begins when it is available for use" but what does this mean in practice? In drug manufacturing you can have an entire facility ready to go but you don't start...
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