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  1. F

    Wei-Jen Lo Suspected of Taking Trade Secrets to Intel

    With a good faith retirement, you don't need to take any work-related documents with you.
  2. F

    Wei-Jen Lo Suspected of Taking Trade Secrets to Intel

    https://www.trendforce.com/news/2025/11/21/news-intel-ceo-lip-bu-tan-denies-allegations-that-former-tsmc-exec-brought-trade-secrets-in/ With speculation mounting that former TSMC SVP Wei-Jen Lo may have taken key materials to Intel, the company’s CEO Lip-Bu Tan has spoken out in response...
  3. F

    Wei-Jen Lo Suspected of Taking Trade Secrets to Intel

    "he left with more than 20 boxes of handwritten documents compiled by his staff."
  4. F

    Wei-Jen Lo Suspected of Taking Trade Secrets to Intel

    Even if he handwrote everything, that still counts as trade secrets.
  5. F

    Nikon Renews Patent Battle with ASML: final capitulation by Nikon in lithography?

    EUV is less predictable than previous litho technologies, because it is fundamentally a stochastic process. A lot of money will be burned. Unfortunately, some of the thinking behind not using EBL, which found the need to use Monte Carlo simulations, did not get used.
  6. F

    Intel AI Leader Sachin Katti Decamps To OpenAI

    By Dylan Martin, Wade Tyler Millward November 10, 2025, 5:25 PM EST Intel CEO made Katti the company’s chief technology and artificial intelligence officer in April. Sachin Katti, Intel’s chief technology and artificial intelligence officer, is leaving the chipmaker for ChatGPT creator OpenAI...
  7. F

    I think Substrate is a $1 Billion Fraud: Part 1

    It has no US patent applications since 2017, based on assignees list here: https://patents.google.com/?q=(X-ray+lithography+optics+pattern+wafer+nm)&country=US&after=priority:20170101&oq=(X-ray+lithography+optics+pattern+wafer+nm)+country:US+after:priority:20170101
  8. F

    New startup, Substrate, looking to compete against ASML

    "These bright pulses of light are transported and shaped by a succession of perfectly polished optics all the way to the silicon wafer." The missing piece is the mask, or reticle. https://substrate.com/our-purpose
  9. F

    New startup, Substrate, looking to compete against ASML

    Apparently, he will not sell this to TSMC, he wants to create his own US-based foundry to compete against TSMC. I suppose he will even compete against Intel.
  10. F

    New startup, Substrate, looking to compete against ASML

    Literally giving their life for their work.
  11. F

    Ex-TSMC Senior VP Wei-Jen Lo Said to Join Intel as Head of R&D — Inside the Career of TSMC’s Most Elusive Veteran

    It's likely he co-wrote or contributed to the policy.
  12. F

    New startup, Substrate, looking to compete against ASML

    I noticed his setup lacked any radiation hazard signs, which should be required for X-ray accelerators. The single-layer prints aren't any better than something that can be done by nanoimprint, which leads to the question of how to control overlay, among other things. X-rays also have worse...
  13. F

    Ex-TSMC Senior VP Wei-Jen Lo Said to Join Intel as Head of R&D — Inside the Career of TSMC’s Most Elusive Veteran

    TSMC has a strong trade secret protection ("Proprietary Information Protection") policy. So, not sure what he can divulge.
  14. F

    Intel's pivotal 18A process is making steady progress, but still lags behind — yields only set to reach industry standard levels in 2027

    Intel's management revealed during the company's Q3 2025 earnings call that while its 18A fabrication process is progressing predictably, with usable yields, enabling the company to begin ramping production of the Core Ultra 300-series processors, codenamed Panther Lake. However, the ramp-up of...
  15. F

    Intel FAB 52/62 are High-Na capable

    Resist blur is more important than the EUV NA.
  16. F

    Intel FAB 52/62 are High-Na capable

    It would be happening in Oregon first, but how much has really happened.
  17. F

    Intel FAB 52/62 are High-Na capable

    18A pitches are too large for High-NA. Or, another way of putting it, if they say they are using single exposure with Low-NA, then the High-NA is disadvantageous due to one-third depth of focus. If they're planning 14A in Fab 52 asap, it sounds like 18A is relatively short-lived.
  18. F

    Intel FAB 52/62 are High-Na capable

    20 mJ/cm2 is too low. That's for the development-only EXE:5000, which is actually discontinued (5 systems total). The EXE:5200 dose was upped to 50 mJ/cm2 (175 WPH).
  19. F

    ASML looks to calm fears over 2026 growth as it warns of China sales decline

    The trend for recognized sales is pretty sobering: Shifting the focus to High-NA further exacerbates this, as they are expected to have slower recognition. As Intel has noted, "The High NA POB is so large, it is not feasible to test and adjust the POB to final spec at the supplier. This means...
  20. F

    TSMC to make advanced 2-nm chips in US sooner to meet AI demand

    Has any High-NA sales been recognized yet? Intel reported mirror replacement at SPIE. The trend of EUV recognized sales per quarter is so far declining this year.
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