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TAIPEI (Taiwan News) — Nvidia CEO Jensen Huang (黃仁勳) announced Monday at Comptex that the company’s new overseas headquarters will be built in Taipei’s Beitou-Shilin area, ending months of speculation and signaling a major expansion in Taiwan.
Dubbed “Nvidia Constellation,” the new office is...
As the semiconductor process further scales down to 2nm and beyond, the multi-patterning technology has emerged as the clear choice of the routing metal layers even within the era of extreme ultraviolet (EUV) lithography.
The stitching technique within multi-patterning can divide a node into...
I know the guy, he's an intense history buff (Asianometry channel covers many interesting historical episodes, not just technological).
But in the complete picture, it isn't enough to only consider the response of the resist to the EUV radiation. You also have to consider the EUV-induced...
Yes, I remember seeing the same report, a D0 of 1.5 would give 30% yield for a 9 mm x 9 mm chiplet.
But this is for an SRAM macro. It might be different for other chips: https://www.digitimes.com/news/a20250325PD228/tsmc-2nm-fab-yield-rate-2025.html
I've always felt EUV R&D should be more exhaustive before implementing in high volume. The amount of R&D wafers needed could be or should be millions.
The list of questions practically has no end.
Here we have undesired exposure to EUV-induced plasma electrons from different exposed fields...
High-NA adds 3 new problems Low-NA doesn't have: (1) reduced depth of focus (so need much thinner resist films); (2) the 104 mm x 132 mm mask area maps to a 26 mm x 16.5 mm wafer exposure field instead of the conventional 26 mm x 33 mm; (3) central obscuration will limit some combinations of...
As 3nm GAA yields stabilize, Samsung Electronics fcuses on 2nm process to narrow TSMC's lead
By Chun Byung-soo, Kim Seo-young
Published 2025.05.13. 16:09
Samsung Electronics’ foundry division is reportedly nearing the final stage of evaluating its 2-nanometer (nm) process with Nvidia and...
Actually the proposed 18A use was reported a while back in Feb (https://www.reuters.com/technology/intel-says-first-two-new-asml-machines-are-production-with-positive-results-2025-02-24/), but it seems now the update is they would only consider it for a few layers of 14A. Maybe they don't have...
FWIW, NA is not figuring into EUV practical resolution. It's resist-limited at this point. https://www.spiedigitallibrary.org/conference-proceedings-of-spie/13424/1342403/NA033-EUV-extension-for-HVM-testing-single-patterning-limits/10.1117/12.3052244.full
Not all EUV machines in use are equally productive. Old/new mix.
Abstract
ASML has been making steady advances in Extreme Ultraviolet (EUV) light source capability for more than 15 years. Since introduction of the 250W EUV light source in 2018, which ushered in the era of EUV High Volume...
