Hi count, thanks for trying to digest my comment. Your questions are good and I hope what I say below throws enough light to address them.
Let us start with the handoff from design to manufacturing. The hand-off is called tape-in. Before the hand-off, it is the responsibility of design to fully verify compliance of their physical polygon drawings to technology rules which include lithography rules. Once the design team runs (and iterates with error fixes), the Design Rule verification algorithms (supplied by Technology Development and run on industry EDA tools), then they are ready to hand-off and the hand-off is called tape-in. There is no expectation that it is an "initial design" and not necessarily ready for manufacturing. It is a one way hand-off of a fully verified design (unless there is a new discovery of physics effects that cannot be solved by manufacturing by itself).
Look at it this way:
1) Manufacturing starts at the point of Tape-in.
2) The first manufacturing step is a "data manipulation" step. This data manipulation step is designed to algorithmically distort the data so that when we actually print the design on the wafer, it is as close to the intended shape as needed. This discipline was born around 2002 (just when we entered the sub-100nm ML nodes) and it was called Optical Proximity Correction (OPC). It is now called Reticle Enhancement Technology. Note the word Correction - as in - pre-distortion of the design so that the effects of the limitation of photolithography equipment and chemistry can be negated. OPC algorithms are supplied by Technology Development team which is also responsible for defining lithography design rules. Nowadays, the correction is so intense that if a designer was to look at the corrected data, he or she will not be able to recognize the design.
We call this first step tape-out which begins as soon as tape-in happens. The reason for choosing this name is that there has been a historical tapeout process that used to (in ancient times) "fracture" the design polygons into trapezoids that the mask making machines were able to understand. So in a sense, as we advanced ML nodes, this tapeout process became more and more complex via introduction of OPC algorithms into the process of Data Prep for mask making. At that point, the tapeout group was moved from the design function to the Technology and Manufacturing function. Hence the need for the design teams to name a new hand-off point - Tape-in (so that Tapeout can be started by manufacturing).
I hope this helps
Sunit