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New SEMI working group--standard practice for metrology at and below 7-nm

S

Sub-nm guy

New member
None of the 1,000 SEMI standards address either scanning capacitance microscopy (SCM) or scanning spreading resistance microscopy (SSRM) which are essential in failure analysis for production support. I head a new SEMI working group addressing this problem which is now critical at and below the 7-nm node. We have members are from GlobalFoundries, Hitachi, IMEC, Micron, NIST, and others. However, we could not reach the metrologists at Samsung or TSMC which are the companies most involved at these nodes. Please suggest new members at Samsung or TSMC or tell me your suggestions. We plan to conduct the first round-robin comparisons of the systems that are used in SCM and SSRM.
 
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