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Japanese scientists develop simplified EUV scanner that can make production of chips considerably cheaper

Seems like a more simplified and cheap approach for reaching EUV with some clear limitations.

I guess a method like this would be an ideal way for nations such as China to quickly enter the lithography industry without the insane capital costs and time required to recreate a six mirror laser-produced plasma light source EUV system.

There are some noticeable drawbacks such as a limit of 0.2-0.3 NA thereby allowing a 16nm half-pitch. In addition to a smaller field size. This can be solved by multi-patterning, and the integration of chiplets.
 
The light from the mask that gets to M2, the outside is reflected to M1, but the center portion goes through the hole straight to wafer, it seems.
Shintake EUV system.png
 
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