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While 2D semiconductors built out of MoS2 are being discussed a lot and are in R&D, why aren't 2D equivalents of silicon and germanium not considered for the construction of 2D channel transistors?
Sir, I've come across papers stating silicene and germanene have ridiculously high mobilities. Germanene's mobility is found to be greater than graphene.
Sir, I've come across papers stating silicene and germanene have ridiculously high mobilities. Germanene's mobility is found to be greater than graphene.
Silicene and Germanene are highly unstable in air. Those appearing properties were mostly reported in high vacuum. Apparently the stability as well as the properties of the ultra-thin semiconductors depend on the substrates on which they were deposited. They were typically deposited on metallic substrates. However, there were some reports using graphene or graphite as the substrates, which yielded air stable ultra-thin Si (https://iopscience.iop.org/article/10.1088/1674-4926/40/6/062001).
Not any time soon . Monolayer TMD (e.g., MoS2) is much more stable than silicene, but not so great either. Its mobility is good (a few hundred cm^2/(Vs)) but not that great.
. Monolayer TMD (e.g., MoS2) is much more stable than silicene, but not so great either. Its mobility is good (a few hundred cm^2/(Vs)) but not that great.