Method of metal integration for fabricating integrated device
Abstract
The fabrication of integrated devices, for example, integrated semiconductor devices is disclosed. The method for metal integration can be used in a process flow for fabricating such an integrated device. The method is based on patterning different spacers and defining different metal structures using the spacers in two separated steps. In particular, metal structures of a first metal material (61) are processed in a different step than metal structure of a second metal material (91).Images (49)



Description
A METHOD OF METAL INTEGRATION FOR FABRICATING AN INTEGRATED DEVICETECHNICAL FIELD
The present disclosure relates to the fabrication of integrated devices, for example, of integrated semiconductor devices. The disclosure presents a method for metal integration, which can be used in a process flow for fabricating such an integrated device.
WO2023236103A1 - Method of metal integration for fabricating integrated device - Google Patents
The fabrication of integrated devices, for example, integrated semiconductor devices is disclosed. The method for metal integration can be used in a process flow for fabricating such an integrated device. The method is based on patterning different spacers and defining different metal structures...
patents.google.com