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Time: 9:00AM Central Europe | 4:00PM China | 5:00PM Japan/Korea Featured Speakers: Jirka Schatz, Applications Engineer, Synopsys Wolfgang Demmerle, Product Manager, Synopsys Metrology data is the foundation for lithography models which play an essential role in process development and photomask creation. In contrast to conventional gauge-based metrology, the extraction of scanning electron microscope (SEM) image contours … |
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