Design Technology CoOptimization at SPIE 2020

Design Technology CoOptimization at SPIE 2020
by Daniel Nenni on 02-14-2020 at 6:00 am

DTCO Fig1 SPIE2020 Semiwiki

SLiC Library tool dramatically accelerates DTCO for 3nm and beyond

In advanced technology nodes below 10nm, Design and Process Technology development have become increasingly intertwined. In older nodes the traditional technology roll-out was done mostly in a sequential manner with clear geometry scaling targets set by … Read More