The Future of Lithography and the End of Moore’s Law!

The Future of Lithography and the End of Moore’s Law!
by Paul McLellan on 07-24-2012 at 10:35 pm

Thisblog with a chart showing that the cost of given functionality on a chip is no longer going to fall is, I think, one of the most-read I’ve ever written on Semiwiki. It is actually derived from data nVidia presented about TSMC, so at some level perhaps it is two alpha males circling each other preparing for a fight. Or, in this… Read More


EUV Masks

EUV Masks
by Paul McLellan on 07-17-2012 at 11:00 pm

This is really the second part to this blog about the challenges of EUV lithography. The next speaker was Franklin Kalk who is CTO of Toppan Photomasks. He too emphasized that we can make almost arbitrarily small features but more and more masks are required (not, that I suspect, he would complain being in the mask business). For EUV… Read More