New Method for Metrology with sub-10 nm Lithrography

New Method for Metrology with sub-10 nm Lithrography
by Daniel Nenni on 05-06-2014 at 6:00 pm

NewPath Research will describe their new method for nanoscale carrier profiling in semiconductors on May 19[SUP]th[/SUP] at the Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) in Saratoga Springs, NY. This new method is intended to fill the gap that has been addressed in the Roadmaps for the semiconductor… Read More