Layout Migration and DRC Correction at DAC 2012

Layout Migration and DRC Correction at DAC 2012
by Daniel Nenni on 05-20-2012 at 5:00 pm

In the world of sub-40nm IC design, as feature size decreases with each new process node, it becomes increasingly difficult to migrate a layout to a new process technology. Too many factors impact manufacturability and yield. At each new process node, to make sure that a given layout is manufacturable and yields well, it is subject… Read More