Curvilinear OPC and next-gen photomask optimization

Curvilinear OPC and next-gen photomask optimization
by Admin on 11-09-2026 at 8:00 am

fig1 manhattan vs curve targets

A vector-based approach for semiconductor manufacturing

By Sagar Saxena is a Senior Product Engineer at Siemens EDA

Curvilinear OPC transforms advanced semiconductor manufacturing

Modern semiconductor manufacturing is experiencing a fundamental shift in the way photomasks are created and optimized. As the industry pushes… Read More


Closing the Stochastics Resolution Gap

Closing the Stochastics Resolution Gap
by Admin on 07-20-2025 at 6:00 am

Closing the Stochastics Resolution Gap

The relentless miniaturization of semiconductor devices has always relied on achieving ever-smaller features on silicon wafers. However, as the industry enters the realm of extreme ultraviolet (EUV) lithography, it faces a critical barrier: stochastics, or the inherent randomness in patterning at atomic scales. This phenomenon… Read More