Direct Write E-beam

Direct Write E-beam
by Paul McLellan on 07-13-2012 at 2:08 pm

One of the presenters at the standing-room only litho session at Semicon this week was Serge Tedesco, the litho program manager at CEA-Leti in Grenoble France. He is running a program called IMAGINE for maskless lithography. Chips today are built using a reticle (containing the pattern for that layer of the chip) which is exposed… Read More