Curvilinear OPC and next-gen photomask optimization

Curvilinear OPC and next-gen photomask optimization
by Admin on 11-09-2026 at 8:00 am

fig1 manhattan vs curve targets

A vector-based approach for semiconductor manufacturing

By Sagar Saxena is a Senior Product Engineer at Siemens EDA

Curvilinear OPC transforms advanced semiconductor manufacturing

Modern semiconductor manufacturing is experiencing a fundamental shift in the way photomasks are created and optimized. As the industry pushes… Read More


Podcast EP354: How Siemens EDA is Conquering New Lithography Challenges with Sagar Saxena

Podcast EP354: How Siemens EDA is Conquering New Lithography Challenges with Sagar Saxena
by Daniel Nenni on 07-10-2026 at 2:00 pm

Daniel is joined by Sagar Saxena, Senior Product Engineer at Siemens EDA specializing in computational lithography, optical proximity correction (OPC), and advanced patterning solutions for leading-edge semiconductor manufacturing. Sagar has led the development and deployment of advanced OPC technologies, including… Read More